Facilities
-
• Pulsed laser deposition system
• Pulsed (1J) Nd:YAG laser (Quantel) with second (500 mJ) and third (200 mJ) harmonic generation
• Carbon dioxide laser (Synrad), 25 W, CW operation
• Nd-YAG laser (GTE-Sylvania, mod. 607), 1 W, CW operation
• Argon ions laser (Spectra-Physics, mod.164-08), 2W, CW operation coupled to a dye (mod.375) and to an intensity stabilizer (mod.373)
• HeNe laser (Melles Griot, 633 and 543 nm)
• Two vacuum bells (Leybold) equipped with rotative and turbomolecular pumps and with optical, electrical, mechanical, and controlled fluid feedthroughs
• Monochromator (SPEX, mod. Minimate) for visible and near infrared radiations
• Monochromator (Acton, mod. 275) equipped with gratings suitable for the visible and near IR radiations, photomultiplier and fibre optics bundle
• Xenon lamp (Muller LXH100)
• Spectrophotometer Varian, model DMS-90
• Spectrophotometers OceanOptics SD2000 and HR4000
• Hall effect-based measurements system (Ecopia)
• Seebeck effect-based measurements system
• Four points measurement systems for semiconductors wafers (Signatone)
• Optical (IR) thermometer for high temperatures, Land Instruments mod. Cyclops 100
• Stereomicroscope (Novex) equipped with videocamera
• Optical bench (TMC)
• Polishing machine (Logitech) for polishing and thinning of substrates (Logitech)
• Precision disk saw (Buehler) for cutting substrates
• Analogue and digital Oscilloscopes (Tektronix)
• Picoamperometer/voltage supply (Keithley, model 6487)
• Stabilized power supplies both at low and high voltage)
• Personal computer equipped with interfaces for controlling the instrumentation and the data acquisition (both analogue and digital)
• Small Electronics workshop with relevant instrumentation
• Mechanical workshop equipped with a small lathe/cutter for metals (Emco)
.
Competences
• Optics and integrated optics• Utilization of low and medium power lasers with emission from the ultraviolet to the medium infrared radiation
• Metal evaporation techniques in vacuum environment by thermoelectric effect, electron gun, ion or laser beam in CW or pulsed operation
• Growth of thin films of metals, semiconductors and dielectrics by evaporation techniques under vacuum
• Laser photoablation
• Optical and electrical characterisation of thin films
• Microprofilometry of surfaces
• Scanning electron microscopy
• Characterisation of materials and devices for electronics and optoelectronics: microreflectivity, photoluminescence, photoluminescence by excitation (PLE), X-ray diffraction, I-V characteristic
• Organic photoluminescent devices and their characterisation
• Organic transistors and their electrical characterisation
• Growth of carbon nanotubes on Si/SiO substrates by Chemical Vapour Deposition (CVD)
• Processing and fabrication of nano-devices based on carbon nanotubes
• Design of masks for photolithography
• Optical and electron beam lithography
• Wet and dry etching, steam oxidation, rapid thermal annealing (RTA)
• Processing and fabrication of optoelectronics devices based on GaAs, GaN, and InP